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Interconnect Performance: An Architectural View
Abstract
A novel way of mapping equivalent communication distance versus
equivalent delay yields an intuitive way of viewing interconnect
performance across multiple process generations. In this talk, the
architectural communication maps for four process roadmaps (one of
which is the ITRS99 Roadmap) give insight into how process
improvements may affect traditional EDA problems, depending on one's
perspective on technological improvement, and bound the impact of
scaling on interconnect performance. While low-k dielectrics may
potentially yield improvements that offset scaling increases in RC
delay, the impact on coupling noise is often only anecdotally studied.
The second part of this talk presents an argument for why we should be
vigilant in our consideration of noise as a part of interconnect
performance, as well as initial simulation results that assess
coupling noise for the four roadmaps.
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